本文设计了惯性约束聚变(ICF)诊断实验用X射线Kirkpatrick－Baez(KB)显微镜，给出了系统的结构参量．使用ZEMAX光学软件对KB型显微镜进行了性能模拟，结果表明：在8keV能点，放大率为8倍时，轴上点的最佳空间分辨率小于2μm，200微米视场的空间分辨率优于10μm．采用磁控溅射方法制备了W／B₄C非周期多层膜，经X射线衍射仪(XRD，工作能量8keV)测量，其反射率为20%，带宽为0．3°，达到了KB型显微镜成像系统的要求．使用Cu靶X射线管进行了成像实验，得到了放大倍数分别为1倍和2倍的一维X射线像．

Ultra-short-period W/C multilayers having periodic thickness range of 1.15---3.01 nm have been fabricated for soft X-ray optics using the high vacuum direct current (DC) magnetron sputtering system. These multilayers were characterized by low-angle X-ray diffraction (LAXRD) and transmission electron microscope (TEM). The results show that the multilayer thin films with periodic thickness more than 1.5 nm have clear W-C interface and low roughness. But the structure of the periodic thickness below 1.5 nm is not clear. Finally, three ways to improve the performance of the multilayers are suggested.

In this paper, a depth-graded C/W multilayer mirror with broad grazing incident angular range, consisting of three multilayer stacks, each of which has different period thickness d and the layer pair number, was designed and fabricated by direct current (DC) magnetron sputtering. For calculating the definite performance of such a mirror, the saturation effects of the interfacial imperfection, such as interface roughness and diffusion, were emerged. The reflectivity of the mirror was measured by the X-ray diffraction (XRD) instrument at Cu Kα radiation (λ = 0.154 nm), the measured reflectivity was about 30% in a broad grazing incident angular range (0.55---0.85 deg.). By the fitting data, the thickness of each layer is almost same as the one designed and the roughness in the multilayer is about 0.85 nm, which is larger than the prospective value of 0.5 nm.